Production of PbO thin film using Silar method and electronic and interface properties of Pb/PbO/p-Si MIS contacts

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dc.authorid0000-0003-2171-8479en_US
dc.contributor.authorErdem, E.
dc.contributor.authorAsubay, S.
dc.contributor.authorGüllü, O.
dc.date.accessioned2023-03-16T08:26:54Z
dc.date.available2023-03-16T08:26:54Z
dc.date.issued2022en_US
dc.departmentDicle Üniversitesi, Fen Fakültesi, Fizik Bölümüen_US
dc.description.abstractIn this paper, using SILAR thin film technique, which is low cost and is easy to control, the lead oxide (PbO) thin film was grown onto both microscope glass and inorganic semiconductor silicon (Si) wafer after appropriate chemical cleaning processes. The coating stage was performed by keeping the solution at 80 celcius. After forming a PbO thin film on the silicon semiconductor, Pb metal was evaporated onto its upper surface. Optical, morphological and structural properties of the PbO thin film formed on glass were investigated. The electrical and interface characteristics of the Pb/PbO/p-Si MIS Schottky diode were investigated in the dark by using current-voltage (I-V), capacity-voltage (C-V) and conductance-voltage (G-V) in 10kHz-2MHz frequency range and capacity-frequency (C-f) characteristics in 1kHz-10MHz frequency range.en_US
dc.identifier.citationErdem, E., Asubay, S. ve Güllü O. (2022). Production of PbO thin film using Silar method and electronic and interface properties of Pb/PbO/p-Si MIS contacts. Journal of Ovonic Research, 18(1), 44-56.en_US
dc.identifier.endpage56en_US
dc.identifier.issn1842-2403
dc.identifier.issn1584-9953
dc.identifier.issue1en_US
dc.identifier.scopusScopusIdYok
dc.identifier.scopusqualityQ3
dc.identifier.startpage44en_US
dc.identifier.urihttps://chalcogen.ro/44_ErdemE.pdf
dc.identifier.urihttps://hdl.handle.net/11468/11422
dc.identifier.volume18en_US
dc.identifier.wosWOS:000754267100001
dc.identifier.wosqualityQ4
dc.indekslendigikaynakWeb of Science
dc.indekslendigikaynakScopus
dc.institutionauthorAsubay, Sezai
dc.language.isoenen_US
dc.publisherVirtual Co Physics Srl.en_US
dc.relation.ispartofJournal of Ovonic Research
dc.relation.publicationcategoryMakale - Uluslararası Hakemli Dergi - Kurum Öğretim Elemanıen_US
dc.rightsinfo:eu-repo/semantics/openAccessen_US
dc.subjectDiodeen_US
dc.subjectMISen_US
dc.subjectPbOen_US
dc.subjectSchottkyen_US
dc.subjectSILARen_US
dc.titleProduction of PbO thin film using Silar method and electronic and interface properties of Pb/PbO/p-Si MIS contactsen_US
dc.titleProduction of PbO thin film using Silar method and electronic and interface properties of Pb/PbO/p-Si MIS contacts
dc.typeArticleen_US

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