Barrier height enhancement of metal/semiconductor contact by an enzyme biofilm interlayer
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Tarih
2013
Dergi Başlığı
Dergi ISSN
Cilt Başlığı
Yayıncı
Taylor & Francis Ltd
Erişim Hakkı
info:eu-repo/semantics/closedAccess
Özet
A metal/interlayer/semiconductor (Al/enzyme/p-Si) MIS device was fabricated using -amylase enzyme as a thin biofilm interlayer. It was observed that the device showed an excellent rectifying behavior and the barrier height value of 0.78eV for Al/-amylase/p-Si was meaningfully larger than the one of 0.58eV for conventional Al/p-Si metal/semiconductor (MS) contact. Enhancement of the interfacial potential barrier of Al/p-Si MS diode was realized using enzyme interlayer by influencing the space charge region of Si semiconductor. The electrical properties of the structure were executed by the help of current-voltage and capacitance-voltage measurements. The photovoltaic properties of the structure were executed under a solar simulator with AM1.5 global filter between 40 and 100mW/cm(2) illumination conditions. It was also reported that the -amylase enzyme produced from Bacillus licheniformis had a 3.65eV band gap value obtained from optical method.
Açıklama
Anahtar Kelimeler
-Amylase, Barrier Height, Series Resistance, Mis Contact
Kaynak
Philosophical Magazine
WoS Q Değeri
Q1
Scopus Q Değeri
Q3
Cilt
93
Sayı
17
